PPT On Enhancement Cut off Frequency of Microstrip Low pass Chebyshev Filter using DGS
Download
Microstrip Low pass Chebyshev Filter using DGS Presentation Transcript:
1.Enhancement Cut off Frequency of Microstrip Low pass Chebyshev Filter using DGS
2.Outlines
Objective of the proposed work
Methodology to Achieve the Objective
Filter Designing
Fabrication of Filter
Low pass filter with DGS
Operational Mechanism
Simulation & Measured Results
Conclusion
References
3.Objective of the proposed work
To achieve 2.5GHz cut off frequency of microstrip low pass Chebyshev filter using DGS.
4.Methodology To Achieve The Objective
Enhancement cut off frequency in the proposed filter is achieved by using defected ground structure.
DGS is using the structures etched in the microwave substrate ground plane. The DGS resonant characteristics are then used in filter design.
(a) Simulation cut off frequency 2.66 GHz
(b) VNA tested cut off frequency 2.715 GHz.
5.Filter Design
5th order Chebyshev Low pass filter using Insertion loss method
6.Design Specification
To design 5th order Chebyshev Low pass filter using Insertion loss method should be as follows
7.Design Specification
8.Design Specification
Impedance and frequency scaling:
For a new load impedance of Ro and cut-off frequency of ?o, the original resistance Rn ,inductance Ln and capacitance Cn are changed by the following formulae:
9.Converting into distributed elements:
10.Fabrication of microstrip filter
Photolithography steps
The pattern on the mask is transferred on the substrate by
means of photolithography
Step1. Clean the substrate, dry thoroughly in front of heat blower.
Step2. Coat the substrate with photo-resist material.
Step3. Preheat the substrate in oven at 98oC -100oC for 10 minutes.
Step4. Now aligned the mask on substrate
Step5. Exposed the substrate now to Ultra Violet rays for 2 minutes.
Download
Microstrip Low pass Chebyshev Filter using DGS Presentation Transcript:
1.Enhancement Cut off Frequency of Microstrip Low pass Chebyshev Filter using DGS
2.Outlines
Objective of the proposed work
Methodology to Achieve the Objective
Filter Designing
Fabrication of Filter
Low pass filter with DGS
Operational Mechanism
Simulation & Measured Results
Conclusion
References
3.Objective of the proposed work
To achieve 2.5GHz cut off frequency of microstrip low pass Chebyshev filter using DGS.
4.Methodology To Achieve The Objective
Enhancement cut off frequency in the proposed filter is achieved by using defected ground structure.
DGS is using the structures etched in the microwave substrate ground plane. The DGS resonant characteristics are then used in filter design.
(a) Simulation cut off frequency 2.66 GHz
(b) VNA tested cut off frequency 2.715 GHz.
5.Filter Design
5th order Chebyshev Low pass filter using Insertion loss method
6.Design Specification
To design 5th order Chebyshev Low pass filter using Insertion loss method should be as follows
7.Design Specification
8.Design Specification
Impedance and frequency scaling:
For a new load impedance of Ro and cut-off frequency of ?o, the original resistance Rn ,inductance Ln and capacitance Cn are changed by the following formulae:
9.Converting into distributed elements:
10.Fabrication of microstrip filter
Photolithography steps
The pattern on the mask is transferred on the substrate by
means of photolithography
Step1. Clean the substrate, dry thoroughly in front of heat blower.
Step2. Coat the substrate with photo-resist material.
Step3. Preheat the substrate in oven at 98oC -100oC for 10 minutes.
Step4. Now aligned the mask on substrate
Step5. Exposed the substrate now to Ultra Violet rays for 2 minutes.
No comments:
Post a Comment